High-NA EUV adoption, supposedly ASML's weak spot, now has all three leading-edge buyers on board, shrinking adoption uncertainty. Intel already runs High-NA in high-volume manufacturing, Samsung takes it for DRAM in 2028, and TSMC just formed a joint initiative with ASML on 12-inch photomasks for High-NA. The ramp stays back-loaded: TSMC won't run it in volume until 2030, and the mask work targets a 2031 pilot line and 2033 production readiness. x.com

